Chemical deposition from solution offers a simple and cost-effective route for fabrication of high quality semiconductor thin films, and is useful for deposition of a large variety of semiconductors. We demonstrate that chemical compatibility between film and substrate materials and tight control over the active deposition mechanism can give rise to a variety of film microstructures upon demand. From size quantized nanocrystalline films, through textured polycrystalline films, to epitaxial monocrystalline films. Consequently, control over optical and electronic properties is attainable, giving rise to a variety of potential applications.

*Recipient of the 2010 IPS Ilse Katz Prize for a graduate student in Nano-Science