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2020 IPS Conference
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Physics in the Industry
Category:
Lectures for this program:
| Lecture Time | Speaker | Lecture subject |
|---|---|---|
| 14:15-14:45 (invited) | Mike Adel |
Symmetry in the service of lithographic process control – an overview of overlay metrology techniques for the 7 nm device node Whereby semiconductor device pitch is bounded by physical limits such as illumination wavelength and numerical apertur... |
| 14:45-15:00 | Haim Feldman |
Speckles Reduction for an Aerial Inspection Tool, Laser Illuminator. Speckles Reduction for an Aerial Inspection Tool, Laser Illuminator[1]. |
| 15:00-15:15 | Asher Yahalom |
Momentum conservation in a relativistic engine In a previous paper we have shown that Newton’s third law cannot strictly hold in a distributed system of which the diff... |
| 15:15-15:30 | Yiftah Silver |
Laboratory Plasma Physics TBA |
| 15:30-15:45 | Shraga Tsur |
Overcoming the 193nm imaging sensor lifetime obstacle DUV radiation damage of the imaging sensor limits the lifetime of current Wafer/Mask Inspection (MI) cameras. |