Sub-nanometer metrology with visible light microscope


  Amnon Manassen  
KLA-Tencor Israel

When using an optical system, it is impossible to see features much smaller than the shortest wavelength used.

However it is possible to measure quantities important for semiconductor processes control down to sub nanometer accuracy, precision and repeatability using a visible light microscope.

KLA-Tencor Israel sells annually hundreds of sophisticated machines performing this task used in all semiconductor manufacturing FABs around the world.

An introduction to this technology and the related challenges will be presented in the lecture.